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ASML launches TWINSCAN NXT:1950i immersion lithography system | ASML
https://www.asml.com/en/news/press-releases/2008/asml-launches-the-twinscan-nxt1950i-immersion-lithography-system
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The TWINSCAN NXT:1950i provides the increased productivity and extremely tight overlay that enables chip manufacturers to shrink feature sizes to 32 nm and beyond.
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